Mounts Botanical is proud to partner with Resource Depot for their annual, “trashformative” wearable art event!
About the Catwalk Program
- The program is designed for students in grades 5 to 12; an application process is required.
- This year’s theme is “In the Garden.”
- The students are given a “trashformation” challenge: construct wearable art made from a variety of traditional and non-traditional materials.
- No experience is necessary!
- Participating students are given access to Resource Depot’s treasure trove of reusable materials.
- Students can participate in weekly workshops, where they learn the basics of using a sewing machine, construction techniques, and receive guidance on how to incorporate the materials they choose.
- Through the use of nontraditional materials, the students gain environmental consciousness while thinking outside of the “trash.”
- All wearable art will be on display in Resource Depot’s GalleRE, April 24 through May 6.
How to Participate
- Students must be able commit to the following dates and be willing to work hard and let their creative juices flow!
- Saturday, February 6 – 1st Mandatory Intro Meeting
- Saturday, February 13 – Tour of Mounts Botanical Garden for Inspiration
- Saturday, April 10 – Workshop (back-up workshop is April 17).
- Friday, April 23 – Runway event at Resource Depot, 6-8 pm
- Saturday, May 8 – Runway event at Mounts Botanical Garden, 10 am-2 pm
- Virtual resources will be available to help students in the process.
- Deadline to apply is February 5, 2021.
- CLICK to be re-directed to the Resource Depot website to apply.
If a student is comfortable with their making skills, they do not have to attend these workshops. They can work at home.
While all students will be given time to work here during the workshops, students must be able to work at home on some aspects of their outfit to ensure completion. Students do not have to make a whole outfit; they can make part of an outfit. We encourage creative thinking and an open mind. Students can make outfits for themselves to model or use someone else as their model.